Fraunhofer CNT, which was opened on 31st May 2005, is an example of the close cooperation between research and manufacturing for which Dresden offers excellent conditions. Due to its advantageous location within the “Silicon Saxony”, it provides ideal collaboration opportunities for research institutes and material/equipment manufacturers in the field of nanoelectronics.
Within the premises of Infineon there is a clean room area (clean room class 1000) of about 800 m² available for the research of Fraunhofer CNT as well as an infrastructure which meets industry standard. The main focus is on the development of special process steps for the manufacturing of high-density memory chips as well as high-performance transistors. Furthermore Fraunhofer CNT works on the development of new analytic and metrology methods and on the analysis of wafer processing results for which considerable laboratories are available.