Process Catalog
Fraunhofer-Center Nanoelektronische Technologien
Metrology/Process Control
| Capability | FEoL/BEoL | Wafer size |
| Review SEM | FEoL/BEoL | 200/300 |
| CD SEM | FEoL/BEoL | 200/300 |
| Optical Microscopy | FEoL/BEoL | 200/300 |
| 3D-Atomic Force Microscopy (AFM) | FEoL/BEoL | 200/300 |
| Profilometry | FEoL/BEoL | 300 |
| X-ray Photoelectron Spectroscopy (XPS) | FEoL/BEoL | 200/300 |
| X-ray Photoelectron Spectroscopy (XPS) | BEoL | 300 |
| X-ray Diffraction (XRD)/ X-ray Reflectrometry (XRR) | FEoL/BEoL | 300 |
| Spectroscopic Ellipsometry (SE) | FEoL/BEoL | 200/300 |
| SP2 Particle Analysis | FEoL/BEoL | 300 |
| Sheet resistance measurements (RS) | FEoL | 200/300 |
| Sheet resistance measurements (RS) | BEoL | 300 |
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