Patterning

Fraunhofer-Center Nanoelektronische Technologien

Tooling and Performance

  • Layout

    Layout

    - Layout creation - Processing of customer layout

  • Coating and Development

    Coating and Developent

    - Resist type (CAR, non-CAR) - Tonality  - Thickness - Hardmask Integration - Mix&Match

  • Proximity Effect Correction (PEC)

    PEC

    - Proximity Effect Correction - Fracturing

  • E-Beam Exposure

    Structuring

    - 50kV Shaped Beam Technology - High throughput - 200 mm & 300 mm

  • Metrology

    Metrology

    - Optical inspection: Inspection Microscope INS3300 (KLA Tencor) - Inline CD-SEM: AMAT Verity 4i CD-SEM - Advanced Analytics: FIB, TEM, AFM etc.