Operation Areas

Fraunhofer-Center Nanoelektronische Technologien

Struktur Patterning

Technology Development

The ITRS roadmap sets targets for future IC manufacturing. Also E-Beam direct write technology keeps track of these targets. In close cooperation with tool and software vendors the CNT patterning group supports investigations in fields of overlay and CD uniformity improvement or benchmarking multy beam concepts and DataPrep software solutions.

- Overlay
- Multi beam concepts
- Uniformity
- DataPrep software