In cooperation with resist suppliers and material manufacturers the patterning group evaluates and characterizes new materials. This is not limited to E-Beam structurable resists but also includes the assessment of adhesives, bottom and top coats etc.

• The evaluation of E-Beam resists may include the following steps:
  - Measurement of the contrast curve
  - Base dose extraction
  - Specification of the resolution limit (dense / isolated structures, LER, cross sections)
  - Process window, linearity
  - Film thickness variation
  - Process variation (PAB, PEB)
  - Delay Stabilities (Vacuum, PCD, PED (air))
  - Extraction of proximity parameters