Within the EU FP7 program MAGIC, Fraunhofer CNT was involved in the development of maskless lithography (known as “ML2”) tools based on multibeam principles and their integration into CMOS manufacturing...

A new patterning method using electron beam direct write (EBDW) was developed at Fraunhofer CNT for a holography demonstrator for SeeReal Technologies GmbH, Dresden.

New opportunities in the field of MEMS/NEMS development by using modern E-Beam Lithography have been created.