Microstructure Analysis

Fraunhofer-Center Nanoelektronische Technologien

Microstructural

Ellipsometry/Porosimetry

Applications
 
Ellipsometry
• Determination of film thickness and material constant of thin films
• Using a spectral range of 190nm to 1700nm (NIR) also samples which are not transparent in the UV range may be analyzed

Porosimetry
• Determination of film thickness and material constants like refractive index.
• Evaluation of the open porosity and the pore size distribution (0.5 nm to 60 nm)
• Determination of the modulus
• Multilayer samples can be investigated
• Effective diffusion coefficients of different solvents can be calculated
• Pore sealing detection

Technical Specifications
 
• E P – 5 from SEMILAB
• Xenon Lamp 75 W
• Beam spot: ca. 2 mm in diameter
• Sample size: 3 mm up to 300 mm in diameter
• Vaccum chamber with < 2 mToor
• Solvents: water, toluene, isopropanol, methanol 
• Spectral range of 190 nm (DUV) to 1700 nm (NIR)
 
Research Areas
 
Investigation of porous ultra low-k (ULK) films:
• Layer thickness
• Porosity and pore size distribution
• Modulus
• Influence of different ULK treatments (Plasmadamage)
• Diffusion behavior in ULK films

Standards for pore size measurements
• Fabrication of specific pore structure
• Model validation using those samples
 
Other materials
• Porous film on top of glass in solar applications
• Porous thin films