Microstructure Analysis

Fraunhofer-Center Nanoelektronische Technologien

Microstructural

Fourier Transformed Infrared Spectroscopy (FTIR)

Applications

Analysis of IR-active thin films
• Organic impurities in MOCVD & Sol-Gel layer
• Bonds in silicon oxide layers, & low-k films
• Photo resists
• High-k dielectrics

Technical specifications

• Varian 640-IR
• DuraGlow IR-Source, KBr Beamsplitter, dLaTGS Detektor
• PikeTech VeeMax II Accessory for variable angle specular reflectance measurements
• ATR (attenuated total reflectance) equipment including ZnSe & Ge crystals 
 
Research Areas

• ATR Investigation of ultra thin film of high-k dielectrics
• Characterization of plasma etch induced damage in ultra low k layers
• Analysis of impurities in ALD layers (i.e carbonates in alkaline earth oxides)