Photoelectron spectroscopy is a surface near method to analyze the chemical composition of a layer. Due to the low sampling depth for laboratory x-ray sources of about 5-10 nm it is ideal for thin film characterization like for barrier purposes. In Fraunhofer CNT we coupled an angle resolved XPS with a commercial available barrier/seed deposition tool to measure the chemical environment, thickness and physical state of these not yet oxidized barriers. Beside the analysis of in situ deposited copper seed and Cobalt-CVD layers it is also possible to measure different ex situ 300 mm samples.