Microscopy & Topography
Fraunhofer-Center Nanoelektronische Technologien
Optical Microscopy - Inline
Applications
• Wafer inspection post processing
• Tilt-view inspections with separate tilt-review module
• Cu and non-Cu process capability
• Automated wafer review
Technical Specifications
• 200mm + 300mm capability
• CCD camera for image saving
• 5 different magnification levels (2,5x, 10x, 50x, 100x, 150x)
• 6th zoom level with DUV source (150x magnification, resolution 200nm)
• Automated defect binning
• Creation of KLA files for later defect review
• Spot check for comparison to reference image
• Overlay measurement capability




Social Bookmarks